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Brand Name : ROYAL
Model Number : RTAS
Certification : CE
Place of Origin : Made in China
MOQ : 2 sets
Price : negotiable
Payment Terms : L/C, T/T
Supply Ability : 6 sets per month
Delivery Time : 11 weeks
Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Deposition Sources : Sputter + Ion source PECVD process
Technique : PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Coating Technology : Vacuum Magnetic Coating, Arc evaporation, magnetron sputtering deposition
name : Ion Plating Machine
Factory Location : Shanghai city, China
Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service : Machine operation, maintenance, coating process Recipes, program
Warranty : Limited warranty 1 year for free, whole life for machine
OEM & ODM : available, we support tailor made design and fabrication
PVD Vacuum Coating Machine / Magnetron Sputtering Coating Machine, metallurgical pvd coating machine
This machine is suitable to the industrial production vacuum coating system. It equips a big size plain arc ion evaporation source and can deposite high performance hard metal film by arc evaporation technology, such as TiN, TiCN,AlTiN and all kinds of other special film according to customer’s requirements.
DLC coating (diamond-like carbon) is the combination of diamond (SP3) and graphite (SP2). The physical and chemical properties of DLC are intermediate to that of diamond and graphite
Specifications
MODEL | RTAS1000 | |||||||
TECHNOLOGY | arc plating + magnetron sputtering + ion source | |||||||
CHAMBER MATERIAL | Stainless Steel (S304) | |||||||
CHAMBER SIZE | Φ1000*1000mm (H) | |||||||
CHAMBER TYPE | Regular octahedron chamber, 2-doors | |||||||
ROTATION RACK & JIG SYSTEM | 6 (8)satellite, Max. weight: 400kgs | |||||||
POWER SUPPLIES | Qty. of Sputtering: 2*24 KW Bias of Power Supply: 1*24W AE power supply for option Ion Source Power supply 2 sets, AE power supply for option | |||||||
DEPOSITION MATERIAL | Ti, Zr, TiAl, Cu, Au | |||||||
DEPOSITION SOURCE |
2 pairs (4 pieces) Sputtering Cathodes + 6 arcs Coating Area: Dia800mm*H550mm; |
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CONTROL | PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models) | |||||||
PUMP SYSTEM | Rotary Vane Pump: SV300B - 1 set (Leybold) | |||||||
Roots Pump: WAU1001 - 1 set (Leybold) | ||||||||
Holding Pump: D60C-1set- (Leybold) | ||||||||
Magnetric Rotor Suspension Molecular Pump: MAG2200 - 2 sets (Leybold) | ||||||||
GAS MASS FLOW CONTROLLER | 3 channels, Made in America (MKS brand) | |||||||
VACUUM GAUGE | Model: ZDF-X-LE, Made in China | |||||||
Linear Ion Source | 2 pieces Pre-treating, plasma cleaning + assisted deposition | |||||||
SAFETY SYSTEM | Numerous safety interlocks to protect operators and equipment | |||||||
HEATING | Heaters: 20KW. Max. temp.: 400℃ | |||||||
COOLING | Industrial Chiller (Cold Water) | |||||||
POWER MAX. | 100KW (Approx.) | |||||||
AVERAGE POWER CONSUMPTION | 45 KW (Approx.) | |||||||
GROSS WEIGHT | T (Approx.) | |||||||
FOOT PRINT | ( L*W*H) 4000*4000 *4000 MM | |||||||
POWER ELECTRICAL | AC 380V/3 phases/50HZ |
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